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- Physikingenieurwesen (PHY) (25) (remove)
In this work, the authors report on investigations of two-photon lithography of positive photoresist. The dependency of the pattern linewidth on variation in the processing parameters, like the laser patterning velocity or power of the femtosecond laser oscillator, is presented. The influence of the scan velocity between 0.38 and 1.90 mm/s on the resolution is discussed for a layer thickness of 3.5 μm. By using a commercial positive photoresist, an aspect ratio of 5 has been realized for grid structures and the qualities of the produced structures are discussed.
Generation of microfluidic flow using an optically assembled and magnetically driven microrotor
(2014)
We report interferometric measurements of the temperature coefficient of the refractive index (dn=dT) and the coefficient of thermal expansion (a) of a praseodymium-doped yttrium lithium fluoride (Pr:YLF) crystal and of a fused silica reference sample. Our phase-resolved interferometric method yields a large number of data points and thus allows a precise measurement and a good error estimation. Furthermore, both dn=dT and a are obtained simultaneously from a single measurement which reduces errors that can occur in separate measurements. Over the temperature range from 20 °C to 80 °C, the value of dn=dT of Pr:YLF decreases from -5.2 x 10-6 /K to -6.2 x 10-6 /K for the ordinary refractive index and from -7.6 x 10-6 /K to -8.6 x 10-6 /K for the extraordinary refractive index. The coefficient of thermal expansion for the a-axis of Pr:YLF increases from 16.4 x 10-6 /K to 17.8 x 10-6 /K over the same temperature range.