Photobleaching-resistant ternary quantum dots embedded in a polymer-coated silica matrix
| Author: | K. Gugula, A. Szydlo, L. Stegemann, C. Strassert, M. Bredol |
|---|---|
| DOI: | https://doi.org/10.1039/C6TC00943C |
| ISSN: | 2050-7526 |
| Parent Title (Multiple languages): | Journal of Materials Chemistry C |
| Document Type: | Article |
| Language: | Multiple languages |
| Year of Completion: | 2016 |
| Year of first Publication: | 2016 |
| Release Date: | 2019/01/11 |
| Volume: | 4 |
| First Page: | 5263 |
| Last Page: | 5269 |
| Institutes: | Chemieingenieurwesen (CIW) |
| Publication list: | Bredol, Michael |
| Licence (German): |  Bibliographische Daten |
