The Effect of X-ray Exposure on Ba2SiO4:Eu3+
| Author: | M.-F. Volhard, Thomas Jüstel |
|---|---|
| DOI: | https://doi.org/10.1016/j.optcom.2017.10.050 |
| Parent Title (English): | Opt. Communications |
| Document Type: | Article |
| Language: | English |
| Date of Publication (online): | 2019/05/14 |
| Year of first Publication: | 2018 |
| Provider of the Publication Server: | FH Münster - University of Applied Sciences |
| Release Date: | 2019/05/14 |
| Volume: | 410 |
| Pagenumber: | 617 |
| First Page: | 622 |
| Faculties: | Chemieingenieurwesen (CIW) |
| Publication list: | Jüstel, Thomas |
| Licence (German): |  Bibliographische Daten |