The Effect of X-ray Exposure on Ba2SiO4:Eu3+
Author: | M.-F. Volhard, Thomas Jüstel |
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DOI: | https://doi.org/10.1016/j.optcom.2017.10.050 |
Parent Title (English): | Opt. Communications |
Document Type: | Article |
Language: | English |
Date of Publication (online): | 2019/05/14 |
Year of first Publication: | 2018 |
Provider of the Publication Server: | FH Münster - University of Applied Sciences |
Release Date: | 2019/05/14 |
Volume: | 410 |
Pagenumber: | 617 |
First Page: | 622 |
Faculties: | Chemieingenieurwesen (CIW) |
Publication list: | Jüstel, Thomas |
Licence (German): | Bibliographische Daten |