TY  - CHAP
A1  - Ostendorf, Andreas
A1  - Gurevich, Evgeny L.
A1  - Shizhou, Xiao
T1  - Fundamentals of Laser-Assisted Micro and Nanotechnologies: Selective Ablation of Thin Films by Pulsed Laser
T2  - Fundamentals of Laser-Assisted Micro- and Nanotechnologies
Y1  - 2014
SN  - 978-3-319-05987-7
SP  - 201
EP  - 219
PB  - Springer
CY  - Berlin
ER  - 
TY  - JOUR
A1  - Aumann, Andreas
A1  - Ksouri, Sarah Isabelle
A1  - Guo, Qingchuan
A1  - Sure, Christian
A1  - Gurevich, Evgeny L.
A1  - Ostendorf, Andreas
T1  - Resolution and aspect ratio in two-photon lithography of positive photoresist
JF  - J. Laser Appl.
N2  - In this work, the authors report on investigations of two-photon lithography of positive photoresist. The dependency of the pattern linewidth on variation in the processing parameters, like the laser patterning velocity or power of the femtosecond laser oscillator, is presented. The influence of the scan velocity between 0.38 and 1.90 mm/s on the resolution is discussed for a layer thickness of 3.5 μm. By using a commercial positive photoresist, an aspect ratio of 5 has been realized for grid structures and the qualities of the produced structures are discussed.
Y1  - 2014
U6  - http://dx.doi.org/10.2351/1.4857275
SN  - 1042-346X
VL  - 26
SP  - 022002
ER  - 
TY  - JOUR
A1  - Guo, Qingchuan
A1  - Ghadiri, Reza
A1  - Weigel, Thomas
A1  - Aumann, Andreas
A1  - Gurevich, Evgeny L.
A1  - Esen, Cemal
A1  - Medenbach, Olaf
A1  - Cheng, Wei
A1  - Chichkov, Boris
A1  - Ostendorf, Andreas
T1  - Comparison of in Situ and ex Situ Methods for Synthesis of Two-Photon Polymerization Polymer Nanocomposites
JF  - Polymers
Y1  - 2014
U6  - http://dx.doi.org/10.3390/polym6072037
SN  - 2073-4360
VL  - 6
SP  - 2037
EP  - 2050
ER  -