@incollection{OstendorfGurevichShizhou2014, author = {Ostendorf, Andreas and Gurevich, Evgeny L. and Shizhou, Xiao}, title = {Fundamentals of Laser-Assisted Micro and Nanotechnologies: Selective Ablation of Thin Films by Pulsed Laser}, series = {Fundamentals of Laser-Assisted Micro- and Nanotechnologies}, booktitle = {Fundamentals of Laser-Assisted Micro- and Nanotechnologies}, publisher = {Springer}, address = {Berlin}, isbn = {978-3-319-05987-7}, pages = {201 -- 219}, year = {2014}, language = {en} } @article{AumannKsouriGuoetal.2014, author = {Aumann, Andreas and Ksouri, Sarah Isabelle and Guo, Qingchuan and Sure, Christian and Gurevich, Evgeny L. and Ostendorf, Andreas}, title = {Resolution and aspect ratio in two-photon lithography of positive photoresist}, series = {J. Laser Appl.}, volume = {26}, journal = {J. Laser Appl.}, issn = {1042-346X}, doi = {10.2351/1.4857275}, pages = {022002}, year = {2014}, abstract = {In this work, the authors report on investigations of two-photon lithography of positive photoresist. The dependency of the pattern linewidth on variation in the processing parameters, like the laser patterning velocity or power of the femtosecond laser oscillator, is presented. The influence of the scan velocity between 0.38 and 1.90 mm/s on the resolution is discussed for a layer thickness of 3.5 μm. By using a commercial positive photoresist, an aspect ratio of 5 has been realized for grid structures and the qualities of the produced structures are discussed.}, language = {en} } @article{GuoGhadiriWeigeletal.2014, author = {Guo, Qingchuan and Ghadiri, Reza and Weigel, Thomas and Aumann, Andreas and Gurevich, Evgeny L. and Esen, Cemal and Medenbach, Olaf and Cheng, Wei and Chichkov, Boris and Ostendorf, Andreas}, title = {Comparison of in Situ and ex Situ Methods for Synthesis of Two-Photon Polymerization Polymer Nanocomposites}, series = {Polymers}, volume = {6}, journal = {Polymers}, issn = {2073-4360}, doi = {10.3390/polym6072037}, pages = {2037 -- 2050}, year = {2014}, language = {en} }